Tantalum wafer, Tantalum disc, Tantalum alloy wafer, Tantalum alloy disc Shenzhen Sunrise Metal Industry Co.,Ltd

0086-0755-27185042
http://www.sunriseta.com
sales@sunriseta.com

Model Number:	ASTM B
Application:	Chemical industry	Dimensions:	Thk:6~20mm	melting point::	2996 degree centigrade
density::	16.6 g/cc

Packaging & Delivery

Packaging Details:	According to customer's requirement
Delivery Detail:	20 days

Specifications

Purity:99.95%min
Size:Thk:6~20mm
Surface finish:16Rms max
RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)

We are factory specializing in the manufacture and export Tantalum and Niobium prodcut .

we can provide many forms as follows

Tantalum wafers, Tantalum discs

Tantalum tungsten wafers, Tantalum tungsten discs

Tantalum sputtering targetsTantalum- tungsten Alloy targets

Tantalum features high melting point , low vapor pressure , good cold processability ,excellent chemical stability , good resistance to corrosion , high dielectric constant ,in surface oxide film .widely used in many industries such aselectronics ,metallurgy, chemical processing , hard alloy cutters , aerospace and aviation.

Material: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)

Size:

circular targets: Diameter 25mm up to 400mm x Thickness 3mm up to 28mm

rectangular targets: Thickness 1mm up to 12.7mm x Width up to 600mm x Length up to 2000mm

Purity: >=99.95% or 99.99%

Table 1: technology parameter

Grade	3N, 3N5, 4N, with Ta 99.99%min
Recrystallization	95%min
Grain size	ASTM 4 or finer
Surface finish	16Rms max. or Ra 0.4 ( RMS64 or better)
Flatness	0.1mm or 0.15% max
Tolerance	+/-0.010" on all dimensions